Imprint Lithography 

Key Features:
SCIL (substrate conformal imprint lithography) technology is particularly suitable for high demand imprint processes. Here a soft stamp is used in combination with a hard but flexible glass carrier, thereby achieving superior evenness of contact and exceptionally high fidelity in pattern transfer.

Imprinting results from capillary forces rather than pressure so that any changes in structure are avoided during the contact process. Furthermore, the sequential contact routine does not allow air gaps to form, which results in extremely high yields and increases productivity.



Large-Area Nano-Imprinting

• Full-area imprint up to 200 mm
• High resolution (< 70 nm)
• High alignment accuracy (± 1 µm)
• Long-life stamp