2. SUSS MicroTec
  3. Mask Aligner

Mask Aligner 

Key Features:
• Fast and highly accurate alignment with SUSS Singlefield or Splitfield Microscope
• HR Optics enables high resolution prints down to 0.5μm
• The Universal Optics Option (UV250/300/400) for fast switching between different wavelengths
• Wafer and substrate handling up to 100mm
• Upgradable with a UV-Nano imprint Lithography toolkit

MJB4

MJB4

The MJB4 Mask Aligner from SUSS MicroTec is the perfect system for laboratories and small volume production.  Easy to use and compact in size, the SUSS MJB4 offers an ideal and cost-effective solution for customers with limited budgets. As an inexpensive photolithography solution the MJB4 has set industry standards specifically for processing of small wafers/substrates and pieces.